A novel surface micromachining process to fabricate AlN unimorph suspensions and its application for RF resonators
نویسندگان
چکیده
A novel surface micromachining process is reported for aluminum nitride (AlN) thin films to fabricate piezoelectric unimorph suspension devices for micro actuator applications. Wet anisotropic etching of AlN thin film is used with a Cr metal mask layer in the microfabrication process. Tetra methyl ammonium hydroxide (TMAH) of 25 wt.% solution is used as an etching solution for the AlN thin films. Polysilicon is used as a structural layer. Highly c-axis oriented AlN thin films are deposited by RF reactive sputtering. Thin layers of chromium on either side of the AlN a t e ©
منابع مشابه
Montreux, Switzerland, 01-03 June 2005 FABRICATION OF SURFACE MICROMACHINED AlN PIEZOELECTRIC MICROSTRUCTURES AND ITS POTENTIAL APPLICATION TO RF RESONATORS
We report on a novel microfabrication method to fabricate aluminum nitride (AlN) piezoelectric microstructures down to 2 microns size by a surface micromachining process. Highly c-axis oriented AlN thin films are deposited between thin Cr electrodes on polysilicon structural layers by rf reactive sputtering. The top Cr layer is used both as a mask to etch the AlN thin films and as an electrode ...
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